photoresist

https://doi.org/10.1351/goldbook.P04651
A @I02944@ material, generally applied as a @T06345@, whose local @S05740@ properties can be altered photochemically. A subsequent development step produces an image which is useful for the fabrication of microelectronic devices (e.g. integrated circuits).
Source:
PAC, 1996, 68, 2223. (Glossary of terms used in photochemistry (IUPAC Recommendations 1996)) on page 2265 [Terms] [Paper]