https://doi.org/10.1351/goldbook.RT07193
@[email protected] material that, when irradiated, undergoes a marked change in @[email protected] in a given solvent or is ablated.
Notes:
- A resist polymer under @[email protected] either forms patterns directly or undergoes chemical reactions leading to pattern formation after subsequent processing.
- A resist material that is optimized for use with @[email protected] or @[email protected] light, an electron beam, an ion beam, or X-rays is called a @[email protected], electron-beam resist, ion-beam resist, or X-ray resist, respectively.
- In a positive-tone resist, also called a positive resist, the material in the irradiated area not covered by a mask is removed, which results in an image with a pattern identical with that on the mask. In a negative-tone resist, also called a negative resist, the non-irradiated area is subsequently removed, which results in an image with a pattern that is the complement of that on the mask.